【今日物理】讲座第13期(2014-2015年度)
发布时间: 2014-12-25   浏览次数: 514

 

  Three-dimensional nanolithography by overcoming the diffraction limit

——2014-2015年度今日物理讲座第十三期  

  

讲座时间:1226日(周五)18:30

讲座地点:二主楼A103

讲座人:Zongsong Gan (甘棕松) 

 

讲座摘要: 

 Artificial photonic structures such as photonic crystals have attracted intense interest due to their unique optical and photonic properties for light manipulation. Optical beam lithography (OBL) provides the most powerful tool for the fabricating of artificial photonic structures with designed geometric configuration. Compared with other nanofabrication techniques, the unique advantage of OBL is its capability of arbitrary three-dimensional fabrication with a resolution about half the wavelength of the used light beam. However, the fabrication resolution of general single-beam OBL is limited due to the diffraction nature of light. In this work, we present the achieving three-dimensional nanolithography by overcoming the diffraction limit with a two-beam strategy. With our technique, we can fabricate lines with a size of only 9 nm. Our technique provides the ultimate tool to fabricate photonic structures that can work in the visible or even UV wavelength range. It also facilitates petabyte optical data storage which will be the essential technology for the future information technology.

 

讲座人简介:

        Dr. Zongsong Gan got his Bachelor of Science degree with major in Physics from Nankai University, China in 2008. After that he came to Centre for Micro-Photonics (CMP), Swinburne University of Technology, Australia and received his PhD in 2013. Then he joined CMP as a postdoctoral staff.  He won the Swinburne’s Vice Chancellor Research Excellence Award for Early Career in 2013. In 2014, he was an awardee of a John Stocker Postdoctoral Fellowship by the Science and Industry Endowment Fund (SIEF) and a Victoria Fellowship by the state government. His main research interests are fluorescence tunning and controlling, super-resolution nanolithography and optical data storage.